@patent {weigl_united_2007,
	title = {United {States} {Patent}: 7196842 - {Attenuating} filter for ultraviolet light},
	number = {7196842},
	year = {2007},
	abstract = {An attenuating filter provides a prescribed attenuation of the intensity of transmitted, short-wavelength, ultraviolet light, in particular, at wavelengths below 200 nm, that is governed by a predefinable spatial distribution of its spectral transmittance. The filter has a transparent substrate (3), e.g. fabricated from crystalline calcium fluoride. A filter coating (5) fabricated from a dielectric material that absorbs over a predefined wavelength range is applied to at least one surface (4) of the substrate. In the case of operating wavelengths of about 193 nm, the filter coating consists largely of tantalum pentoxide. Filters of the type, which may be inexpensively fabricated with high yields, are noted for their high abilities to withstand laser radiation and may be effectively antireflection coated employing simply designed antireflection coatings.},
	url = {http://patft.uspto.gov/netacgi/nph-Parser?Sect1=PTO2\&Sect2=HITOFF\&p=1\&u=\%2Fnetahtml\%2FPTO\%2Fsearch-bool.html\&r=16\&f=G\&l=50\&co1=AND\&d=PTXT\&s1=\%22Weigl\%3B+Bernhard\%22.INNM.\&OS=IN/\%22Weigl;+Bernhard\%22\&RS=IN/\%22Weigl;+Bernhard\%22},
	author = {Weigl, Bernhard and DE and Paul, Hans-Jochen and DE and Eva, Eric and DE}
}
@patent {weigl_united_2001,
	title = {United {States} {Patent}: 6294296 - {Method} and device for mutually aligning a mask pattern formed in a mask and a substrate},
	number = {6294296},
	year = {2001},
	month = {sep},
	abstract = {In a method for mutually aligning a mask pattern formed in a mask 1 and a substrate 2, on which the mask pattern is to be imaged, by using setting marks 12a, 12b and 13a or 13b in the mask 1 and in the substrate 2, the alignment is performed with the aid of an imaging system and a light beam with polarized light 9. A phase shift for the first diffraction orders 20 is undertaken in the beam path 9a, 9b. Higher diffraction orders 21 and unwanted light are filtered out after the phase shift, and after the filtering out the light beams of the first diffraction orders 20 are detected, and the result is evaluated for the purpose of alignment.},
	url = {http://patft.uspto.gov/netacgi/nph-Parser?Sect1=PTO2\&Sect2=HITOFF\&p=1\&u=\%2Fnetahtml\%2FPTO\%2Fsearch-bool.html\&r=28\&f=G\&l=50\&co1=AND\&d=PTXT\&s1=\%22Weigl\%3B+Bernhard\%22.INNM.\&OS=IN/\%22Weigl;+Bernhard\%22\&RS=IN/\%22Weigl;+Bernhard\%22},
	author = {Weigl, Bernhard and DE}
}
